Cleaning
Cleaning
Cleaning, an essential step when operating on the micro and nanoscale, is used to remove contaminants from the surface of the substrate before it is used in another fabrication process. This sometimes means simply burning away material, often using an asher to do this. Ashers use heat to remove unwanted material, such as photoresist. They are often used to clean a wafer, although they can sometimes be used to selectively etch away material as well.
List of available equipment
TOOL MAKE AND MODEL
LOCATION
Electrocleaning, DigitalMatrix PMT-16
ANFF VIC MCN
Large ultrasonic wash tank system
ANFF OPTOFAB ANU
Medium ultrasonic wash tank
ANFF OPTOFAB ANU
Microwave plasma asher, AlphaPlasma Q235 Asher
ANFF NSW UNSW
O2 plasma asher, Custom Asher
ANFF NSW UNSW
O2 plasma asher, Denton Asher
ANFF NSW UNSW
Plasma Asher, Gasonics L3510
ANFF QLD Griffith
Plasma Asher, PlasmaTech V50
ANFF SA
Plasma Cleaner, Diener Zepto
ANFF ACT
Plasma cleaner, Harrick Plasma PDC-002
ANFF QLD UQ - AIBN
Small ultrasonic wash tank
ANFF OPTOFAB ANU
Spin Rinse Dryer, OEM
ANFF NSW USYD
Spin Rinse Dryer, OEM Etch
ANFF NSW USYD
Spin Rinse Dryer, Semitool 260-SRD
ANFF QLD Griffith
Ultrasonic bath, Elma Sonicator
ANFF ACT
Wash Station, Semi-automated large substrate
ANFF OPTOFAB ANU