Cleaning
Cleaning
Cleaning, an essential step when operating on the micro and nanoscale, is used to remove contaminants from the surface of the substrate before it is used in another fabrication process. This sometimes means simply burning away material, often using an asher to do this. Ashers use heat to remove unwanted material, such as photoresist. They are often used to clean a wafer, although they can sometimes be used to selectively etch away material as well.
List of available equipment
TOOL MAKE AND MODEL
LOCATION
Electrocleaning, DigitalMatrix PMT-16
ANFF VIC MCN
Large ultrasonic wash tank system
ANFF OPTOFAB ANU
Medium ultrasonic wash tank
ANFF OPTOFAB ANU
Microwave plasma asher, AlphaPlasma Q235 Asher
ANFF NSW UNSW
O2 plasma asher, Custom Asher
ANFF NSW UNSW
O2 plasma asher, Denton Asher
ANFF NSW UNSW
OEM Spin Rinse Dryer, Etch
ANFF NSW USYD
Plasma Asher, Gasonics L3510
ANFF QLD Griffith
Plasma Asher, PlasmaTech V50
ANFF SA
Plasma Cleaner, Diener Zepto
ANFF ACT
Plasma cleaner, Harrick Plasma PDC-002
ANFF QLD UQ - AIBN
Small ultrasonic wash tank
ANFF OPTOFAB ANU
Spin Rinse Dryer, OEM
ANFF NSW USYD
Ultrasonic bath, Elma Sonicator
ANFF ACT
Wash Station, Semi-automated large substrate
ANFF OPTOFAB ANU
TOOL MAKE AND MODEL
LOCATION
Electrocleaning, DigitalMatrix PMT-16
Description
It is an instrument for electrocleaning and passivation layer formation which is one of the the process steps for fabricating a copy of the Master mould (Ni shim). Passivation layer will make it easy for separation/un-zipping of the two Ni metal shims after electroforming.
Related Information
The instrument uses highly alkalline based electrolyte and runs automated electrocleaning and passivation anodic/cathodic cycles to clean the sample surface first to form a passivating thin oxide layer.
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
LOCATION
Microwave plasma asher, AlphaPlasma Q235 Asher
Description
The AlphaPlasma Q235 Asher is a microwave plasma system designed for photoresist removal, surface cleaning, and material processing in semiconductor fabrication and research applications. It operates at 2.45 GHz microwave power, adjustable between 50–1200 watts, and features a 235 mm chamber diameter, accommodating substrates up to 8 inches.
Related Information
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
LOCATION
O2 plasma asher, Custom Asher
Plasma asher
Description
The Plasma Asher is a high-performance plasma cleaning system designed for photoresist removal, surface activation, and organic contamination elimination in semiconductor fabrication and nanotechnology applications.
Related Information
More information to come. Plasma asher
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
LOCATION
O2 plasma asher, Denton Asher
Plasma asher
Description
The Denton Asher O₂ Plasma Asher is a high-performance plasma cleaning system designed for photoresist removal, surface activation, and organic contamination elimination in semiconductor fabrication and nanotechnology applications.
Related Information
More information to come. Plasma asher
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
LOCATION
OEM Spin Rinse Dryer, Etch
Wafer Cleaning tool
Description
The OEM Spin Rinse Dryer (SRD) is a wet processing tool designed for cleaning, rinsing, and drying semiconductor wafers after etching or other fabrication steps. It ensures high-purity processing with automated resistivity monitoring and efficient water usage.
Related Information
Can accommodate up to 6 inch round wafers Wafer Cleaning tool
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
LOCATION
Plasma Asher, Gasonics L3510
Description
Downstream photoresist removal system, designed for clean, damage-free removal of the most difficult resist structures.
Related Information
Tool Contact
glenn.walker@griffith.edu.au
TOOL MAKE AND MODEL
LOCATION
Plasma Asher, PlasmaTech V50
Plasma asher
Description
Used primarily for ashing photoresist materials from substrates.
Related Information
Used in the fabrication of microfluidic devices. The system can be also used be used for various other surface treatments. Plasma asher
Tool Contact
ANFF-SA@unisa.edu.au
TOOL MAKE AND MODEL
LOCATION
Plasma cleaner, Harrick Plasma PDC-002
Plasma cleaner
Description
For nanoscale surface cleaning and surface activation. Used when making a glass-PDMS or PDMS-PDMS microfluidic chip
Related Information
Provides an organic material etch rate of 5-10 nm/min Plasma cleaner
Tool Contact
anff@uq.edu.au
TOOL MAKE AND MODEL
LOCATION
Spin Rinse Dryer, OEM
Wafer Cleaning tool
Description
The OEM Spin Rinse Dryer (SRD) is a wet processing tool designed for cleaning, rinsing, and drying semiconductor wafers after etching or other fabrication steps. It ensures high-purity processing with automated resistivity monitoring and efficient water usage.
Related Information
Can accommodate up to 6 inch square wafers Wafer Cleaning tool
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
LOCATION
Ultrasonic bath, Elma Sonicator
Ultrasonic bath
Description
Ultrasonic cleaning bath for sample mask cleaning.
Related Information
Used for mask cleaning ~200x200 mm² with variable power and frequecy capabilities.
Tool Contact
horst.punzmann@anu.edu.au