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Maskless lithography
Maskless lithography
Maskless lithography can be used to speed up the lithography process, and to save money by negating the need to fabricate steps required. Micropatterning is a lithography process that involves an image being projected directly onto a photoresist without the use of a mask.
List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Direct Write Heidelberg MLA150
More information to come.
Melbourne Centre for Nanofabrication
VIC Node
Description
Maskless aligner MLA150 is a photlolithography tool that provides non-contact exposure, outstanding
ease of use, and high speed, making it the ideal tool in rapid prototyping environments, for
low- to mid-volume production, and Research & Development.
Related Information
The MLA150 is equipped with both 405nm and 375nm solid state laser sources. It is equipped with write mode I and is capable of producing minimum structure size of 0.6um. The system comes equipped with an automated handling unit which can support batch direct-write lithography on standard size wafers such as 6in and 4in substrates as well as 5in mask plates.
Tool Contact
mcn-enquiries@nanomelbourne.com
DMO ML3 Pro direct writer
More information to come.
NSW Node
University of New South Wales
Description
Direct write maskless aligner
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
Intelligent Micropatterning SF100 XPRESS
Maskless micropatterning system
Melbourne Centre for Nanofabrication
VIC Node
Description
A maskless photolithography system capable of writing features down to 1 μm, that offers speed and cost benefits over masked systems.
Related Information
A wide range of materials can be processed, and provides great control in writing and aligning fine features on smaller substrates. The process us non-contact, which reduces risk of damaged samples. Commonly used to quickly and accurately create photomasks.
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Direct Write Heidelberg MLA150
More information to come.
Melbourne Centre for Nanofabrication
VIC Node
Description
Maskless aligner MLA150 is a photlolithography tool that provides non-contact exposure, outstanding
ease of use, and high speed, making it the ideal tool in rapid prototyping environments, for
low- to mid-volume production, and Research & Development.
Related Information
The MLA150 is equipped with both 405nm and 375nm solid state laser sources. It is equipped with write mode I and is capable of producing minimum structure size of 0.6um. The system comes equipped with an automated handling unit which can support batch direct-write lithography on standard size wafers such as 6in and 4in substrates as well as 5in mask plates.
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
DMO ML3 Pro direct writer
More information to come.
Melbourne Centre for Nanofabrication
VIC Node
Description
Direct write maskless aligner
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Intelligent Micropatterning SF100 XPRESS
Maskless micropatterning system
Melbourne Centre for Nanofabrication
VIC Node
Description
A maskless photolithography system capable of writing features down to 1 μm, that offers speed and cost benefits over masked systems.
Related Information
A wide range of materials can be processed, and provides great control in writing and aligning fine features on smaller substrates. The process us non-contact, which reduces risk of damaged samples. Commonly used to quickly and accurately create photomasks.
Tool Contact
mcn-enquiries@nanomelbourne.com
