
Microwave Plasma Enhanced Chemical Vapour Deposition (MPCVD)
Microwave Plasma Enhanced Chemical Vapour Deposition (MPCVD)
MPCVD is a chemical vapour deposition process which uses a continuous microwave source to create and help to maintain a highly reactive plasma made up of the reacting chemicals and necessary catalysts. MPCVD is heavily used in the ANFF network to deposit layers of diamond – methane and hydrogen are introduced and used to grow new diamond on a diamond-seeded substrate. ANFF equipment can introduce dopants to the carbon structure while its being grown. These include boron which can create superconducting diamond, and nitrogen vacancies which can produce interesting photo-luminescence properties that are being exploited for quantum information systems.
List of available equipment
TOOL MAKE AND MODEL
LOCATION
CVD, Seki AX6300
ANFF OPTOFAB Macquarie
Microwave Diamond Deposition, BDD
ANFF VIC MCN
Microwave Diamond Deposition, NV
ANFF VIC MCN
Microwave Plasma Deposition System (MWCVD), Astex PDS-17
ANFF NSW UTS
Microwave Plasma Deposition System (MWCVD), Seki Plasma Deposition System
ANFF NSW UTS
MOCVD, Aixtron 3x2FT system III-N
ANFF ACT
MOCVD, Aixtron 200/4 system
ANFF ACT
MOCVD, Aixtron 3x2FT system III-V
ANFF ACT