Nano Imprint Lithography
Nano Imprint Lithography
Nanoimprint lithography uses a transparent mould to deform a layer of photoresist into a desired topography. Light is then passed through the clear mould to cure the resist and make these deformations permanent. This technique relies on the accuracy of the mould but can be used to create many identical versions of the same structure.
List of available equipment
TOOL MAKE AND MODEL
LOCATION
Mask Aligner, EVG 620 with UV Nanoprint
ANFF VIC MCN
Nano-imprint Lithography, EVG 620
ANFF ACT
TOOL MAKE AND MODEL
LOCATION
Mask Aligner, EVG 620 with UV Nanoprint
Mask aligner and resist exposure system with NIL capability
Description
A high-resolution mask aligner with split-field microscopes that is capable of handling multiple wafer sizes with quick change-over time. Features back side alignment capability for mask aligning.
Related Information
Used for a variety of applications to transfer multiple layers of nanoscale patterns into photoresist films.Provides a minimum feature size of approximately 1 µm. Mask aligner and resist exposure system with NIL capability
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
LOCATION
Nano-imprint Lithography, EVG 620
UV lithography and NIL exposure
Description
Standard optical lithography and Nano-Imprint UV Lithography.
Related Information
Process pieces up to 6 inch wafer with 1 micron resolution. Offers top-side alignment. UV lithography and NIL exposure
Tool Contact
horst.punzmann@anu.edu.au