Spin coating and wafer development
Spin coating and wafer development
Spin coaters are capable of applying uniform thickness polymer films, such as a resist to substrates. Resist is essential for many types of lithography, such as UV lithography. Resists are termed either positive or negative — this denotes whether, when cured, chemical bonds are made or broken, and therefore whether the sections of resist that remain are either the true pattern, or it’s inverse. This selection must be considering etching or deposition stages that may follow as it will help to make.
List of available equipment
TOOL MAKE AND MODEL
LOCATION
Coat and Develop Track, SVG 8600 Series
ANFF OPTOFAB ANU
Coater and develoer system, Picotrack
ANFF NSW USYD
Combination Spinner/Hotplate, SUSS Delta 80
ANFF VIC MCN
Developer, Station Mounted EDC-650HZ-8NPP
ANFF QLD Griffith
Hotplat, HG Programmable
ANFF VIC MCN
Laminator, Sky 325R6
ANFF VIC MCN
Lithography Track System, PicoTRACK PCT-150RRE
ANFF VIC MCN
Photolithograpy Thermal Curing, EV Group EVG105
ANFF WA
Spin coater and developer, Pico Track Automatic
ANFF VIC MCN
Spin coater, Karl Suss RC8 Gyrosett
ANFF VIC RMIT
Spin Coater, LAURELL WS-400-6NPP-LITE
ANFF VIC Latrobe
Spin Coater, Laurell WS-400A
ANFF MATERIALS Newcastle
Spin coater, Polos Spin 150i NPP
ANFF QLD UQ - AIBN
Spin coater, Polos Spin 150i NPP
ANFF QLD UQ - Long Pocket
Spin coater, Sawatec
ANFF QLD UQ - AIBN
Spin coater, SPS POLOS
ANFF ACT
Spin coater, SSE OPTIcoat ST22+
ANFF QLD Griffith
Spin coater, SSE OPTIspin SST20
ANFF QLD Griffith
Spin coater, SUSS 6 inch wafer
ANFF VIC MCN
Spin coater, Suss Delta 80
ANFF SA
Spin coater, Suss Delta RC80+
ANFF VIC MCN
Spin/Spray Coater, EVG 101
ANFF SA