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Surface treatment
Surface treatment
Surface treatment is the process of modifying the physical and chemical properties of a material’s surface, usually to enhance its appearance, durability, or functionality. Surface treatment can involve various methods such as coating, etching, polishing, cleaning, or grafting.
List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
UV/Ozone Cleaner
More information to come.
Melbourne Centre for Nanofabrication
VIC Node
Description
A UV/Ozone Cleaner is a device used to clean surfaces through a combination of ultraviolet (UV) light and ozone gas
Related Information
This device clean surfaces through a combination of ultraviolet (UV) light and ozone gas. This process generates highly reactive oxygen species that break down organic contaminants and sterilize surfaces effectively. UV/Ozone cleaners are commonly utilised in semiconductor manufacturing, research laboratories, and cleanroom environments for thorough and efficient surface cleaning and sterilisation.
Tool Contact
mcn-enquiries@nanomelbourne.com
Vacuum oven- Yield Engineering Systems (YES) 310TA
HDMS oven
Griffith University
QLD Node
Description
A HMDS vapour is heated to 150°C in a vacuum chamber and modifies the surface of the substrate in a controlled and reproducible manner.
Related Information
Used to promote adhesion of photoresist to standard semiconductor substrates. Priming is effective for approximately 3 weeks. HMDS vapor priming is a surface treatment technique that improves adhesion between a substrate and photoresist.
Tool Contact
glenn.walker@griffith.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
UV/Ozone Cleaner
More information to come.
Griffith University
QLD Node
Description
A UV/Ozone Cleaner is a device used to clean surfaces through a combination of ultraviolet (UV) light and ozone gas
Related Information
This device clean surfaces through a combination of ultraviolet (UV) light and ozone gas. This process generates highly reactive oxygen species that break down organic contaminants and sterilize surfaces effectively. UV/Ozone cleaners are commonly utilised in semiconductor manufacturing, research laboratories, and cleanroom environments for thorough and efficient surface cleaning and sterilisation.
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Vacuum oven- Yield Engineering Systems (YES) 310TA
HDMS oven
Griffith University
QLD Node
Description
A HMDS vapour is heated to 150°C in a vacuum chamber and modifies the surface of the substrate in a controlled and reproducible manner.
Related Information
Used to promote adhesion of photoresist to standard semiconductor substrates. Priming is effective for approximately 3 weeks. HMDS vapor priming is a surface treatment technique that improves adhesion between a substrate and photoresist.
Tool Contact
glenn.walker@griffith.edu.au
