ACT Node - Australian National Fabrication Facility Limited

ANFF ACT

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Overview

ANFF-ACT facility provides a range of capabilities and services for the micro/nanofabrication of photonic and related devices as well as the fabrication of waveguides and photonic crystals.

The node, located at the Australian National University, specialises in photonic/electronic materials growth, and the processing and fabrication of devices including micro electro-mechanical systems (MEMS). These capabilities provide a range of services for the fabrication of photonic and related devices as well as the production of waveguides and photonic crystals.

ANFF-ACT works closely with two renowned research groups based at ANU’s Laser Physics Centre and the Department of Electronic Materials Engineering. These groups bring expertise in the capabilities of high-energy ion implantation, Si-etching, optical characterisation and two metal organic chemical vapour deposition (MOCVD) reactors for the growth of III-V compound semiconductor multilayers based on: GaAs, AIGaAs, InGaAs, InP, InGaAsP, InAlGaAs, GaSb, InSb, InGaAsN. These reactors enable the fabrication of nanowires, quantum dots, quantum wells, strained layers and devices.

ANFF-ACT facilities provide a dynamic, exciting and collaborative atmosphere where researchers can get the most from their ideas with the best possible support and world class equipment.

Services include the scale-up prototyping of devices such as organic solar cells, organic light emitting diodes, organic circuit elements, microfluidic devices, bioassay platforms, biomaterial scaffolds, microbioreactors and production of materials for microelectronics to semiconductor-industry standards.

Node Competencies

Specialist fields: micro/nano fabrication of photonic and related devices; fabrication of waveguides and photonic crystals; Micro electro-mechanical systems (MEMS).

Flagship facilities: Electron beam lithography (EBL); sputtering system for metal and dielectric multi-layer deposition; Cluster tool for dry etching and deposition; Dual beam focused ion beam; Nano imprint lithography.

Contact

Node Director: Prof Hoe Tan
Email: Hoe.Tan@anu.edu.au
Phone: +61 2 6125 0363

Facility Manager: Dr Kaushal Vora
Email: kaushal.vora@anu.edu.au
Phone: +61 2 6125 1594

Booking System Visti Website

Location

Australian National University (ANU)

Address

Research School of Physics
building #160, Level 3, End of Mills Road
The Australian National University
Canberra ACT 2601
+61 2 6125 0001

Equipment

Experts

Prof Hoe Tan

(ho taan)

Node Director

Prof Hoe Tan is an expert in the epitaxy of compound semiconductors.

Deposition, Materials Synthesis and Modification

Australian National University (ANU)

Contact Prof Hoe Tan

Dr Kaushal Vora

(kaw-SHAAL VOR-ah)

Node Manager

Dr Kaushal Vora has broad experience in developing nanofabrication processes, cleanroom operations and user training.

Deposition, Lithography, Testing and validation

Australian National University (ANU)

Contact Dr Kaushal Vora

Dr Satyanarayan Barik

(SAAT-ya-na-RA-yuhn BA-rick)

Process Engineer

Satyanarayan, known as Satya, worked on the epitaxial growth, intermixing, and characterisation of InAs/InP quantum dots using MOCVD. He has over 20 years of hands‑on experience in III–V semiconductor processing, thin‑film deposition, plasma systems, and device fabrication across both research and industry. Satya has worked extensively with MOCVD and RPCVD reactors, as well as vacuum and plasma systems. He has experience with a wide range of micro‑ and nanofabrication and characterisation tools, including AFM, XRD, PL, and solar‑cell measurement techniques.

Deposition, Etching, Lithography, Modelling and Device Design, Testing and validation, Wafer processing

Australian National University (ANU)

Contact Dr Satyanarayan Barik

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