ANFF’s 4th Direct Write Lithography Workshop was held on 2 February 2026 at the Sydney Nanoscience Hub, University of Sydney, bringing together the country’s direct write lithography community both in person and online.

Organised by the ANFF Direct Write Lithography Expert Working Group, the one-day event once again connected nanoscale infrastructure professionals and researchers working at the forefront of nanotechnology.

The workshop explored the latest advances in direct write lithography, spanning electron, photon and ion beam technologies, alongside emerging approaches shaping future nanofabrication capability.

Three keynote presentations anchored the program. Dr Gerald Lopez (UPenn Singh Center for Nanotechnology) examined process characterisation and isofocality in electron beam lithography. Dr Eleanor Mullen (The University of Queensland) presented a life cycle perspective on green nanofabrication in the semiconductor industry. Dr John Petersen (IMEC) challenged the community to rethink lithography limits in advanced packaging interconnects.

Together, the workshop reinforced ANFF’s role in convening expertise, sharing insight and strengthening Australia’s direct write lithography ecosystem.