Skip to content

Services
Commercialisation
Locations
- ANFF Headquarters
- ACT Node
- NSW Node
- QLD Node
- SA Node
- VIC Node
- WA Node
- OptoFab Node
- Materials Node
About
Resources
News & Events
Online Learning
Get in touch

Services
Commercialisation
Locations
- ANFF Headquarters
- ACT Node
- NSW Node
- QLD Node
- SA Node
- VIC Node
- WA Node
- OptoFab Node
- Materials Node
About
Resources
News & Events
Online Learning
Get in touch

Formation of Ge nanoparticles in SiOxNy by ion implantation and thermal annealing

By Paul McGarry / January 1, 2015

← Previous Publications

Next Publications →

Acknowledgement of Country

ANFF acknowledges the Traditional Owners of Country throughout Australia and pays respect to Elders past and present. We also acknowledge the First Nations people of Australia as engineers and scientists in whose tradition and footsteps we aspire to follow.

About ANFF
Locations
Careers

About ANFF
Locations
Careers

ANFF Enlightened.
Access to facilities
Feedback

ANFF Enlightened.
Access to facilities
Feedback

New Expert Details

New Expert Details

Subscribe to our newsletter

First Name

Last Name

Email

© 2024 Australian National Fabrication Facility Limited

ABN: 50 124 231 661

Site by Juno

Follow us: