Direct laser lithography
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Direct laser lithography

Laser processing uses a highly controlled and focused beam of high-energy photons of the same wavelength to burn away material. These processes are repeatable, scalable and cheap, but can induce thermal stresses on the substrate, and resolutions tend to be in the micrometre regime. Laser processing is often used within ANFF to create masks for later lithography steps, but it can also be used to create patterns directly into the substrate itself, skipping several ordinary fabrication steps.

List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Direct Laser Writer- Heidelberg MLA150
More information to come.
QLD Node University of Queensland
Description
Direct writing of structures down to 1µm in photoresist coated substrates and writing of chrome masks.
Related Information
The design is loaded in GDS2 format which controls the stage movement and pixel exposure.
Tool Contact
anff@uq.edu.au
Direct Write Laser- Dilase 650
Direct laser lithography system
SA Node University of South Australia
Description
This equipment offers the possibility to work with one or two writing lasers, to be focused into one to two beam sizes ranging from 1µm to 50 µm. Writes over a surface area as large as 6 x 6 inches.
Related Information
Used for direct write rapid prototyping and mask fabrication. Writing is possible on any type of substrate, including: photomasks, semiconductors, glass, polymers, crystals, flexible films.
Tool Contact
Simon.Doe@unisa.edu.au
Direct Write Laser- Heidelberg 66+
Direct laser lithography system
NSW Node University of Sydney
Description
Direct write laser lithography system capable of high resolution and grayscale patterning
Related Information
375 nm laser wavelength, multiple write modes. Capable of achieving sub 500 nm features with highest resolution, alignment, maximum write area 200 x 200 mm
Tool Contact
rpf.queries@sydney.edu.au
Direct Write Laser- Heidelberg MLA150_1
Maskless Aligner
RMIT VIC Node
Description
Maskless Aligner
Related Information
Minimum Structure Size [μm]: 1 μm; Maximum Write Area [mm²]: 150 x 150; Alignment Accuracy*[3σ, nm] for 100 x 100 mm²: <=500.
Tool Contact
arnan.mitchell@rmit.edu.au
Direct Write Laser- Heidelberg MLA150_2
Lab-on-a-chip, Microfluidic chip fabrication, integration and interfacing
SA Node University of South Australia
Description
This equipment offers you the possibility to work with one or two writing lasers, to be focused into one to two beam sizes ranging from 1µm to 50 µm. Writes over a surface area as large as 6 x 6 inches.
Related Information
Used for direct write rapid prototyping and mask fabrication. Writing is possible on any type of substrate, including: photomasks, semiconductors, glass, polymers, crystals, flexible films.
Tool Contact
Simon.Doe@unisa.edu.au
Direct Write Laser- Heidelberg MLA150
Maskless direct write system
University of Western Australia WA Node
Description
Direct writing of structures down to 0.6 µm in photoresist coated substrates.
Related Information
Maskless lithography is an alternative to the traditional mask aligner that exposes the pattern directly onto the substrate surface with a spatial light modulator (SLM). The MLA 150 offers flexibility, throughput, and performance for fast prototyping on various substrates. The minimum feature size is 0.6 micron.
Tool Contact
anff-wa@uwa.edu.au
NanoScribe
More information to come.
Melbourne Centre for Nanofabrication VIC Node
Description
The NanoScribe Photic Professional GT2 (PPGT2) is a direct laser lithography system that uses two-photon polymerisation for additive 3D printing. A focal spot volume is defined by an IR femtosecond laser that concentrates light pulses and within this volume polymerisation occurs. The X-, Y- and Z-coordinate of a CAD model is defined by a focal spot volume, allowing for a CAD design to be printed as a 3D nanostructure layer-by-layer.
Related Information
Two-photon polymerization is based on the principle of photopolymerization. Here, targeted exposure to light triggers the polymerization, or the process to bring monomers together to create a polymer chain, of synthetic resins. This chain reaction causes the molecules to bond and harden, resulting in 3D models.
Tool Contact
mcn-enquiries@nanomelbourne.com
Nanno 3D printer- Nanoscribe Photonic Professional GT
100-nanometre resolution 3D printer
QLD Node University of Queensland
Description
3D Printing with a minimum voxel size of 100 x 350 nm. The dual photon technology is used to construct high resolution and complex structures in polymers (such as AZ resist, SU8 and proprietary IP resists from Nanoscribe).
Related Information
Uses a IR femto second laser to concentrate pulses to within a small polymerisation volume equivalent to UV light. Within this volume polymerisation occurs to create nanoscale 3D structures. Resists sensitive to UV light can be used. Substrates can be up to 5 inch square.
Tool Contact
anff@uq.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Direct Laser Writer- Heidelberg MLA150
More information to come.
QLD Node University of Queensland
Description
Direct writing of structures down to 1µm in photoresist coated substrates and writing of chrome masks.
Related Information
The design is loaded in GDS2 format which controls the stage movement and pixel exposure.
Tool Contact
anff@uq.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Direct Write Laser- Dilase 650
Direct laser lithography system
QLD Node University of Queensland
Description
This equipment offers the possibility to work with one or two writing lasers, to be focused into one to two beam sizes ranging from 1µm to 50 µm. Writes over a surface area as large as 6 x 6 inches.
Related Information
Used for direct write rapid prototyping and mask fabrication. Writing is possible on any type of substrate, including: photomasks, semiconductors, glass, polymers, crystals, flexible films.
Tool Contact
Simon.Doe@unisa.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Direct Write Laser- Heidelberg 66+
Direct laser lithography system
QLD Node University of Queensland
Description
Direct write laser lithography system capable of high resolution and grayscale patterning
Related Information
375 nm laser wavelength, multiple write modes. Capable of achieving sub 500 nm features with highest resolution, alignment, maximum write area 200 x 200 mm
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Direct Write Laser- Heidelberg MLA150_1
Maskless Aligner
QLD Node University of Queensland
Description
Maskless Aligner
Related Information
Minimum Structure Size [μm]: 1 μm; Maximum Write Area [mm²]: 150 x 150; Alignment Accuracy*[3σ, nm] for 100 x 100 mm²: <=500.
Tool Contact
arnan.mitchell@rmit.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Direct Write Laser- Heidelberg MLA150_2
Lab-on-a-chip, Microfluidic chip fabrication, integration and interfacing
QLD Node University of Queensland
Description
This equipment offers you the possibility to work with one or two writing lasers, to be focused into one to two beam sizes ranging from 1µm to 50 µm. Writes over a surface area as large as 6 x 6 inches.
Related Information
Used for direct write rapid prototyping and mask fabrication. Writing is possible on any type of substrate, including: photomasks, semiconductors, glass, polymers, crystals, flexible films.
Tool Contact
Simon.Doe@unisa.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Direct Write Laser- Heidelberg MLA150
Maskless direct write system
QLD Node University of Queensland
Description
Direct writing of structures down to 0.6 µm in photoresist coated substrates.
Related Information
Maskless lithography is an alternative to the traditional mask aligner that exposes the pattern directly onto the substrate surface with a spatial light modulator (SLM). The MLA 150 offers flexibility, throughput, and performance for fast prototyping on various substrates. The minimum feature size is 0.6 micron.
Tool Contact
anff-wa@uwa.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
NanoScribe
More information to come.
QLD Node University of Queensland
Description
The NanoScribe Photic Professional GT2 (PPGT2) is a direct laser lithography system that uses two-photon polymerisation for additive 3D printing. A focal spot volume is defined by an IR femtosecond laser that concentrates light pulses and within this volume polymerisation occurs. The X-, Y- and Z-coordinate of a CAD model is defined by a focal spot volume, allowing for a CAD design to be printed as a 3D nanostructure layer-by-layer.
Related Information
Two-photon polymerization is based on the principle of photopolymerization. Here, targeted exposure to light triggers the polymerization, or the process to bring monomers together to create a polymer chain, of synthetic resins. This chain reaction causes the molecules to bond and harden, resulting in 3D models.
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Nanno 3D printer- Nanoscribe Photonic Professional GT
100-nanometre resolution 3D printer
QLD Node University of Queensland
Description
3D Printing with a minimum voxel size of 100 x 350 nm. The dual photon technology is used to construct high resolution and complex structures in polymers (such as AZ resist, SU8 and proprietary IP resists from Nanoscribe).
Related Information
Uses a IR femto second laser to concentrate pulses to within a small polymerisation volume equivalent to UV light. Within this volume polymerisation occurs to create nanoscale 3D structures. Resists sensitive to UV light can be used. Substrates can be up to 5 inch square.
Tool Contact
anff@uq.edu.au

    Acknowledgement of Country

    ANFF acknowledges the Traditional Owners of Country throughout Australia and pays respect to Elders past and present. We also acknowledge the First Nations people of Australia as engineers and scientists in whose tradition and footsteps we aspire to follow.

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