Furnaces
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Furnaces

High temperature furnaces used to melt materials to create glass fibre fabrication.

List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
1100C 6” tube furnace
High temperature annealing
Australian National University (ANU) Optofab Node
Description
High temperature furnace
Related Information
More information to come.
Tool Contact
stephen.madden@anu.edu.au
Carbolite Gero Tube Furnace
Horizontal furnace
Materials Node University of Wollongong
Description
Horizontal tube furnace
Related Information
More information to come.
Tool Contact
innis@uow.edu.au
Custom Glass melter
Controlled atmosphere oxide glass melting facilities.
Optofab Node University of Adelaide
Description
Facility consisting of a 6-port Heraeus glovebox with integrated furnaces
Related Information
Consists of one 900 degree C melting furnace, and three 500 C degree annealing furnaces.
Tool Contact
optofab@adelaide.edu.au
Firing furnace
Tube furnace
RMIT VIC Node
Description
1200C Tube furnaces (3-zone)
Related Information
1200C Tube furnace (3-zone)
Tool Contact
arnan.mitchell@rmit.edu.au
Furnace – Thermal (Wet/Dry)
More information to come.
Melbourne Centre for Nanofabrication VIC Node
Description
Wet and dry oxidation furnace.
Related Information
Supports up to 150mm in diameter and can deposit up to 50 wafers in one run.
Tool Contact
mcn-enquiries@nanomelbourne.com
Furnace- Hitech CTF/150/3Z/1200C
Oxidation Furnace
QLD Node University of Queensland
Description
Dry thermal oxidation produces high integrity oxides compared to sputtered, evaporated or PECVD films. Dry thermal oxidation of silicon to create SiO2 films up to 300 nm thick. The temperature and gas flow are tightly controlled.
Related Information
Silicon is heated to more than 1,000°C in an oxygen rich environment. Highly customisable gas flow and temperature profiles.Sample size of up to 6" wafers. Up to 25 wafers per run. Maximum temperature of 1200°C.
Tool Contact
anff@uq.edu.au
Furnace- Hitech Oxidation
More information to come.
Griffith University QLD Node
Description
Small batch size horizontal atmospheric furnace for the thermal oxidation of Silicon
Related Information
Oxidation furnace for the thermal oxidation of Silicon.
Tool Contact
glenn.walker@griffith.edu.au
Thermco oxidation furnace
Oxidation furnace for Si only
NSW Node University of New South Wales
Description
clean Si oxidation furnace
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
Thermco UDOX
Ultra dry oxidation (UDOX) furnace for Si only
NSW Node University of New South Wales
Description
UDOX ultra-clean Si oxidation furnace (MOS)
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
1100C 6” tube furnace
High temperature annealing
NSW Node University of New South Wales
Description
High temperature furnace
Related Information
More information to come.
Tool Contact
stephen.madden@anu.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Carbolite Gero Tube Furnace
Horizontal furnace
NSW Node University of New South Wales
Description
Horizontal tube furnace
Related Information
More information to come.
Tool Contact
innis@uow.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Custom Glass melter
Controlled atmosphere oxide glass melting facilities.
NSW Node University of New South Wales
Description
Facility consisting of a 6-port Heraeus glovebox with integrated furnaces
Related Information
Consists of one 900 degree C melting furnace, and three 500 C degree annealing furnaces.
Tool Contact
optofab@adelaide.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Firing furnace
Tube furnace
NSW Node University of New South Wales
Description
1200C Tube furnaces (3-zone)
Related Information
1200C Tube furnace (3-zone)
Tool Contact
arnan.mitchell@rmit.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Furnace – Thermal (Wet/Dry)
More information to come.
NSW Node University of New South Wales
Description
Wet and dry oxidation furnace.
Related Information
Supports up to 150mm in diameter and can deposit up to 50 wafers in one run.
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Furnace- Hitech CTF/150/3Z/1200C
Oxidation Furnace
NSW Node University of New South Wales
Description
Dry thermal oxidation produces high integrity oxides compared to sputtered, evaporated or PECVD films. Dry thermal oxidation of silicon to create SiO2 films up to 300 nm thick. The temperature and gas flow are tightly controlled.
Related Information
Silicon is heated to more than 1,000°C in an oxygen rich environment. Highly customisable gas flow and temperature profiles.Sample size of up to 6" wafers. Up to 25 wafers per run. Maximum temperature of 1200°C.
Tool Contact
anff@uq.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Furnace- Hitech Oxidation
More information to come.
NSW Node University of New South Wales
Description
Small batch size horizontal atmospheric furnace for the thermal oxidation of Silicon
Related Information
Oxidation furnace for the thermal oxidation of Silicon.
Tool Contact
glenn.walker@griffith.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Thermco oxidation furnace
Oxidation furnace for Si only
NSW Node University of New South Wales
Description
clean Si oxidation furnace
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Thermco UDOX
Ultra dry oxidation (UDOX) furnace for Si only
NSW Node University of New South Wales
Description
UDOX ultra-clean Si oxidation furnace (MOS)
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au

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    ANFF acknowledges the Traditional Owners of Country throughout Australia and pays respect to Elders past and present. We also acknowledge the First Nations people of Australia as engineers and scientists in whose tradition and footsteps we aspire to follow.

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