HF Etching
HF Etching
HF etching is a dry vapor (plasma-less) etch process to remove sacrificial oxide layers, primarily used to release silicon MEMS structures.
List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Small Etching Cell
More information to come.
Melbourne Centre for Nanofabrication
VIC Node
Description
Microporous silicon is fabricated by etching silicon in HF-based solutions under applied voltage. It is a complete solution for porous silicon formation and electro-polishing of silicon.
Related Information
Porous silicon in small batches
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Small Etching Cell
More information to come.
Melbourne Centre for Nanofabrication
VIC Node
Description
Microporous silicon is fabricated by etching silicon in HF-based solutions under applied voltage. It is a complete solution for porous silicon formation and electro-polishing of silicon.
Related Information
Porous silicon in small batches
Tool Contact
mcn-enquiries@nanomelbourne.com