
Ion Implantation, Doping and Diffusion
Ion Implantation, Doping and Diffusion
Incorporating a dopant can allow a material to take on novel features – this could include changing a material’s hardness, reactivity, optical and electrical properties, or any number of other adjustments. To introduce the impurity, the substrate is typically heated, or the new material is propelled into the sample.
List of available equipment
TOOL MAKE AND MODEL
LOCATION
Furnace, Thermco boron diffusion
ANFF NSW UNSW
Furnace, Thermco phosphorus diffusion
ANFF NSW UNSW
Ion implanter, IBS IMC-200
ANFF NSW UNSW