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Ion implantation, doping and diffusion
Ion implantation, doping and diffusion
Incorporating a dopant can allow a material to take on novel features – this could include changing a material’s hardness, reactivity, optical and electrical properties, or any number of other adjustments. To introduce the impurity, the substrate is typically heated, or the new material is propelled into the sample.
List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
IBS IMC-200
Ion implanter
NSW Node
University of New South Wales
Description
ion implanter
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
Thermco boron diffusion
Furnace for diffusion of boron
NSW Node
University of New South Wales
Description
boron diffusion furnace
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
Thermco phosphorus diffusion
Furnace for diffusion of phosphorus
NSW Node
University of New South Wales
Description
phosphorus diffusion furnace
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
IBS IMC-200
Ion implanter
NSW Node
University of New South Wales
Description
ion implanter
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Thermco boron diffusion
Furnace for diffusion of boron
NSW Node
University of New South Wales
Description
boron diffusion furnace
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Thermco phosphorus diffusion
Furnace for diffusion of phosphorus
NSW Node
University of New South Wales
Description
phosphorus diffusion furnace
Related Information
More information to come.
Tool Contact
anff@unsw.edu.au
