Microwave Plasma-enhanced Chemical Vapour Deposition (MPCVD)
Home > Equipment > Deposition > Microwave Plasma-enhanced Chemical Vapour Deposition (MPCVD)
Microwave Plasma-enhanced Chemical Vapour Deposition (MPCVD)

MPCVD is a chemical vapour deposition process which uses a continuous microwave source to create and help to maintain a highly reactive plasma made up of the reacting chemicals and necessary catalysts.MPCVD is heavily used in the ANFF network to deposit layers of diamond – methane and hydrogen are introduced and used to grow new diamond on a diamond-seeded substrate. ANFF equipment can introduce dopants to the carbon structure while its being grown. These include boron which can create superconducting diamond, and nitrogen vacancies which can produce interesting photo-luminescence properties that are being exploited for quantum information systems.

List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Seki AX6300
MPCVD system for deposition of diamond
Macquarie University Optofab Node
Description
CVD reactor for growing polydiamond films from methane/hydrogen chemistries.
Related Information
2 inch sample stage
Tool Contact
benjamin.johnston@mq.edu.au
Seki CVD- small unit
MPCVD system for deposition of doped diamond
NSW Node University of Technology Sydney
Description
Small bell-jar type reactor for growing small samples of doped diamond films
Related Information
Doped films. Nitrogen, Boron, Germanium, Nickel etc.
Tool Contact
blake.regan@uts.edu.au
Seki AX6300
MPCVD system for deposition of boron-doped diamond
Melbourne Centre for Nanofabrication VIC Node
Description
Used to coat seeded samples of any shape with boron-doped diamond.
Related Information
Deposits at approximately 1 µm/h.Maximum sample size is 2 inches.
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Seki AX6300
MPCVD system for deposition of diamond
Melbourne Centre for Nanofabrication VIC Node
Description
CVD reactor for growing polydiamond films from methane/hydrogen chemistries.
Related Information
2 inch sample stage
Tool Contact
benjamin.johnston@mq.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Seki CVD- small unit
MPCVD system for deposition of doped diamond
Melbourne Centre for Nanofabrication VIC Node
Description
Small bell-jar type reactor for growing small samples of doped diamond films
Related Information
Doped films. Nitrogen, Boron, Germanium, Nickel etc.
Tool Contact
blake.regan@uts.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Seki AX6300
MPCVD system for deposition of boron-doped diamond
Melbourne Centre for Nanofabrication VIC Node
Description
Used to coat seeded samples of any shape with boron-doped diamond.
Related Information
Deposits at approximately 1 µm/h.Maximum sample size is 2 inches.
Tool Contact
mcn-enquiries@nanomelbourne.com