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Vapour phase etching
Vapour phase etching
Vapour phase etching involves exposing a substrate to a corrosive chemical in vapour form which will remove material that it comes into contact with. The sections of material that are removed can be selected by protecting parts of the substrate that are desired to be kept with a mask or coating.
List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Custom HF etching
HF etching facilities
Optofab Node
University of Adelaide
Description
Hydrofluoric acid etching facilities.
Related Information
Hydrofluoric etching facilities in a specialised laboratory environment. Capability to etch glass and other materials.
Tool Contact
optofab@adelaide.edu.au
Idonus HF Vapour Etch
HF Vapour Etcher
QLD Node
University of Queensland
Description
Performs dry etching of SiO2. HF vapour chemically etches SIO2 while substrate is heated
Related Information
Allows stiction free release of mechanical structures.
Tool Contact
anff@uq.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Custom HF etching
HF etching facilities
QLD Node
University of Queensland
Description
Hydrofluoric acid etching facilities.
Related Information
Hydrofluoric etching facilities in a specialised laboratory environment. Capability to etch glass and other materials.
Tool Contact
optofab@adelaide.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Idonus HF Vapour Etch
HF Vapour Etcher
QLD Node
University of Queensland
Description
Performs dry etching of SiO2. HF vapour chemically etches SIO2 while substrate is heated
Related Information
Allows stiction free release of mechanical structures.
Tool Contact
anff@uq.edu.au