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Wetbench
Wetbench
A wetbench is a potentially automated process tool that is used to carry out wet etching or cleaning steps of a fabrication process.
List of available equipment
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Automated Wetbench Suite
Set of wet benches for wet processing
Melbourne Centre for Nanofabrication
VIC Node
Description
The automated wet-bench suite is comprised of three custom made instruments – a manual wet processing deck, a semi-automated chemical cleaning station and an IPA aerosol vapour dryer. All three wetbench instruments are designed to accommodate 25 wafers processing at a time resulting in high throughput and large volume of chemical ensure repeatable results. The wetbench suite significantly reduces the risk of using dangerous chemical by eliminating beakers and safe waste management systems.
Related Information
Manual wet processing baths - KOH, Cr etcher, 5% H2SO4, IPA and DI water. Semi-automated chemical cleaning station (enclosed, exhausted) baths - piranha, SC-2, buffered oxide etch (BOE), DI water and ultrasonic acetone de-scum station. The IPA aerosol vapour dryer dries without any need for heaters or rotation. Substrate size - Up to 6 ". Batch processing - Up to 25 wafers.
Tool Contact
mcn-enquiries@nanomelbourne.com
PDMS Casting Bench
More information to come.
Melbourne Centre for Nanofabrication
VIC Node
Description
General purpose workspace devoted to the preparation and casting of PDMS materials
Related Information
PDMS casting involves the fabrication of polydimethylsiloxane (PDMS) structures by pouring the liquid polymer into a mold and allowing it to cure. This technique is widely used in microfluidics, soft robotics, and biomedical applications due to PDMS's biocompatibility, flexibility, and ease of fabrication
Tool Contact
mcn-enquiries@nanomelbourne.com
Reynolds Tech Hotplate Tower
Stacked Hotplate tower
NSW Node
University of Sydney
Description
Exhausted stacked hotplates for baking during solvent based processes
Related Information
Includes 4 hotplates dedicated to different temperature ranges - used for baking/outgassing purposes
Tool Contact
rpf.queries@sydney.edu.au
Reynolds Tech Wet Bench – Acid
Wet Bench for general purpose acid processes
NSW Node
University of Sydney
Description
Exhausted wet bench used for handling of general purpose acids
Related Information
Includes integrated stirring hotplate, heated and filtered process tank and cascading tank for batch processing
Tool Contact
rpf.queries@sydney.edu.au
Reynolds Tech Wet Bench – Caustic Develop
Wet Bench for caustic development processes
NSW Node
University of Sydney
Description
Exhausted wet bench used for handling of caustic based chemicals - primarily TMAH based developers
Related Information
Includes automated spin process unit for development of wafers up to 7 inches squared.
Tool Contact
rpf.queries@sydney.edu.au
Reynolds Tech Wet Bench – Chromium etch
Wet Bench for Chromium etch processes
NSW Node
University of Sydney
Description
Exhausted wet bench used for handling of chromium etch chemicals
Related Information
Includes automated spin process unit for etching of wafers up to 7 inches squared.
Tool Contact
rpf.queries@sydney.edu.au
Reynolds Tech Wet Bench – EBL Resist Coating
Wet Bench for electron beam lithography resist coating processes
NSW Node
University of Sydney
Description
Exhausted wet bench used for resist coating processes dedicated to EBL resists
Related Information
Includes two spinners dedicated to PMMA and CSAR/ZEP processes
Tool Contact
rpf.queries@sydney.edu.au
Reynolds Tech Wet Bench – General Purpose
Wet Bench for general purpose caustic etch processes
NSW Node
University of Sydney
Description
Exhausted wet bench used for handling of general purpose caustic based chemicals
Related Information
Includes integrated stirring hotplate, heated and filtered process tank and cascading tank for batch processing
Tool Contact
rpf.queries@sydney.edu.au
Reynolds Tech Wet Bench – Hydrofluric acid
Wet bench for Hydrofluoric acid processes
NSW Node
University of Sydney
Description
Exhausted wet bench used for handling of hydrofluoric acid
Related Information
Includes heated process tank and cascading tank for rinsing.
Tool Contact
rpf.queries@sydney.edu.au
Reynolds Tech Wet Bench – Photolithography Resist coating
Wet Bench for photolithography resist coating processes
NSW Node
University of Sydney
Description
Exhausted wet bench used for resist coating processes dedicated to thicker photolithography based resists
Related Information
Includes three spinners dedicated to positive, negative and thick resist processes
Tool Contact
rpf.queries@sydney.edu.au
Reynolds Tech Wet Bench -Lift-off process
Wet bench for solvent based lift-off processes
NSW Node
University of Sydney
Description
Exhausted wet bench used for solvent based metal lift-off and cleaning processes
Related Information
Includes three heated ultrasonic tanks, an ambient filtered tank, and a cascading tank
Tool Contact
rpf.queries@sydney.edu.au
Reynolds Tech Wet Bench -Solvent Develop
Wet bench for solvent based development processes
NSW Node
University of Sydney
Description
Exhausted wet bench used for solvent based development processes
Related Information
Includes cold plate for cold development processes
Tool Contact
rpf.queries@sydney.edu.au
Reynolds Tech Wet Bench
Wet Bench for general purpose acid processes
NSW Node
University of Sydney
Description
Exhausted wet bench used for handling of general purpose acids
Related Information
Includes two integrated stirring hotplates and a cascading tank for rinsing
Tool Contact
rpf.queries@sydney.edu.au
Robotic Wet Bench
More information to come.
Melbourne Centre for Nanofabrication
VIC Node
Description
Robotic wet bench is a semi-automated chemical cleaning station which comprises of RCA cleaning baths (DI water, SC1, SC2 and HF buffered oxide etch baths) and megasonic acetone cleaning (Lift off) bath. Robotic wet bench is designed to accommodate 25 wafers processing at a time resulting in high throughput and large volume of chemical ensure repeatable results. The Robotic wet bench system significantly reduces the risk of using dangerous chemical by eliminating beakers and safe waste management.
Related Information
The Robotic wet bench is a semi- automated process tool that is used to carry out wet etching or cleaning steps of a fabrication process. It has four baths for RCA cleaning of wafers- DI water, SC1 (piranha cleaning), SC2 (HCl + H2O2) and HF buffered oxide etch. In addition it has a megasonic acetone cleaning bath for lift off process.
Tool Contact
mcn-enquiries@nanomelbourne.com
Standalone Wet Bench
More information to come.
Melbourne Centre for Nanofabrication
VIC Node
Description
Standalone wet bench is a manual chemical processing station having six separtated baths- KOH etching, Cr etching, DI water cleaning, and the rest baths are currently not in use. This wet bench is designed to accommodate 25 wafers processing at a time resulting in high throughput and large volume of chemical ensure repeatable results. This wet bench system significantly reduces the risk of using dangerous chemical by eliminating beakers and safe waste management.
Related Information
The Standalone wet bench is a wet chemical process tool that eliminates glasswares during processing as well as the safe waste management system to carry out wet etching or cleaning steps of a fabrication process.
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Automated Wetbench Suite
Set of wet benches for wet processing
Melbourne Centre for Nanofabrication
VIC Node
Description
The automated wet-bench suite is comprised of three custom made instruments – a manual wet processing deck, a semi-automated chemical cleaning station and an IPA aerosol vapour dryer. All three wetbench instruments are designed to accommodate 25 wafers processing at a time resulting in high throughput and large volume of chemical ensure repeatable results. The wetbench suite significantly reduces the risk of using dangerous chemical by eliminating beakers and safe waste management systems.
Related Information
Manual wet processing baths - KOH, Cr etcher, 5% H2SO4, IPA and DI water. Semi-automated chemical cleaning station (enclosed, exhausted) baths - piranha, SC-2, buffered oxide etch (BOE), DI water and ultrasonic acetone de-scum station. The IPA aerosol vapour dryer dries without any need for heaters or rotation. Substrate size - Up to 6 ". Batch processing - Up to 25 wafers.
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
PDMS Casting Bench
More information to come.
Melbourne Centre for Nanofabrication
VIC Node
Description
General purpose workspace devoted to the preparation and casting of PDMS materials
Related Information
PDMS casting involves the fabrication of polydimethylsiloxane (PDMS) structures by pouring the liquid polymer into a mold and allowing it to cure. This technique is widely used in microfluidics, soft robotics, and biomedical applications due to PDMS's biocompatibility, flexibility, and ease of fabrication
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Reynolds Tech Hotplate Tower
Stacked Hotplate tower
Melbourne Centre for Nanofabrication
VIC Node
Description
Exhausted stacked hotplates for baking during solvent based processes
Related Information
Includes 4 hotplates dedicated to different temperature ranges - used for baking/outgassing purposes
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Reynolds Tech Wet Bench – Acid
Wet Bench for general purpose acid processes
Melbourne Centre for Nanofabrication
VIC Node
Description
Exhausted wet bench used for handling of general purpose acids
Related Information
Includes integrated stirring hotplate, heated and filtered process tank and cascading tank for batch processing
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Reynolds Tech Wet Bench – Caustic Develop
Wet Bench for caustic development processes
Melbourne Centre for Nanofabrication
VIC Node
Description
Exhausted wet bench used for handling of caustic based chemicals - primarily TMAH based developers
Related Information
Includes automated spin process unit for development of wafers up to 7 inches squared.
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Reynolds Tech Wet Bench – Chromium etch
Wet Bench for Chromium etch processes
Melbourne Centre for Nanofabrication
VIC Node
Description
Exhausted wet bench used for handling of chromium etch chemicals
Related Information
Includes automated spin process unit for etching of wafers up to 7 inches squared.
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Reynolds Tech Wet Bench – EBL Resist Coating
Wet Bench for electron beam lithography resist coating processes
Melbourne Centre for Nanofabrication
VIC Node
Description
Exhausted wet bench used for resist coating processes dedicated to EBL resists
Related Information
Includes two spinners dedicated to PMMA and CSAR/ZEP processes
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Reynolds Tech Wet Bench – General Purpose
Wet Bench for general purpose caustic etch processes
Melbourne Centre for Nanofabrication
VIC Node
Description
Exhausted wet bench used for handling of general purpose caustic based chemicals
Related Information
Includes integrated stirring hotplate, heated and filtered process tank and cascading tank for batch processing
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Reynolds Tech Wet Bench – Hydrofluric acid
Wet bench for Hydrofluoric acid processes
Melbourne Centre for Nanofabrication
VIC Node
Description
Exhausted wet bench used for handling of hydrofluoric acid
Related Information
Includes heated process tank and cascading tank for rinsing.
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Reynolds Tech Wet Bench – Photolithography Resist coating
Wet Bench for photolithography resist coating processes
Melbourne Centre for Nanofabrication
VIC Node
Description
Exhausted wet bench used for resist coating processes dedicated to thicker photolithography based resists
Related Information
Includes three spinners dedicated to positive, negative and thick resist processes
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Reynolds Tech Wet Bench -Lift-off process
Wet bench for solvent based lift-off processes
Melbourne Centre for Nanofabrication
VIC Node
Description
Exhausted wet bench used for solvent based metal lift-off and cleaning processes
Related Information
Includes three heated ultrasonic tanks, an ambient filtered tank, and a cascading tank
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Reynolds Tech Wet Bench -Solvent Develop
Wet bench for solvent based development processes
Melbourne Centre for Nanofabrication
VIC Node
Description
Exhausted wet bench used for solvent based development processes
Related Information
Includes cold plate for cold development processes
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Reynolds Tech Wet Bench
Wet Bench for general purpose acid processes
Melbourne Centre for Nanofabrication
VIC Node
Description
Exhausted wet bench used for handling of general purpose acids
Related Information
Includes two integrated stirring hotplates and a cascading tank for rinsing
Tool Contact
rpf.queries@sydney.edu.au
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Robotic Wet Bench
More information to come.
Melbourne Centre for Nanofabrication
VIC Node
Description
Robotic wet bench is a semi-automated chemical cleaning station which comprises of RCA cleaning baths (DI water, SC1, SC2 and HF buffered oxide etch baths) and megasonic acetone cleaning (Lift off) bath. Robotic wet bench is designed to accommodate 25 wafers processing at a time resulting in high throughput and large volume of chemical ensure repeatable results. The Robotic wet bench system significantly reduces the risk of using dangerous chemical by eliminating beakers and safe waste management.
Related Information
The Robotic wet bench is a semi- automated process tool that is used to carry out wet etching or cleaning steps of a fabrication process. It has four baths for RCA cleaning of wafers- DI water, SC1 (piranha cleaning), SC2 (HCl + H2O2) and HF buffered oxide etch. In addition it has a megasonic acetone cleaning bath for lift off process.
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
KEY DIFFERENTIATOR
LOCATION
Standalone Wet Bench
More information to come.
Melbourne Centre for Nanofabrication
VIC Node
Description
Standalone wet bench is a manual chemical processing station having six separtated baths- KOH etching, Cr etching, DI water cleaning, and the rest baths are currently not in use. This wet bench is designed to accommodate 25 wafers processing at a time resulting in high throughput and large volume of chemical ensure repeatable results. This wet bench system significantly reduces the risk of using dangerous chemical by eliminating beakers and safe waste management.
Related Information
The Standalone wet bench is a wet chemical process tool that eliminates glasswares during processing as well as the safe waste management system to carry out wet etching or cleaning steps of a fabrication process.
Tool Contact
mcn-enquiries@nanomelbourne.com
