Furnaces
Furnaces
High temperature furnaces used to melt materials to create glass fibre fabrication.
List of available equipment
TOOL MAKE AND MODEL
LOCATION
Annealing furnace, GaAs ULVAC MILA-500
ANFF NSW UNSW
Annealing furnace, GP ULVAC MILA-500
ANFF NSW UNSW
Ashing Furnace, Carbolite Gero AAF 1100
ANFF OPTOFAB Adelaide
Bottom Loading Furnace, Carbolite Gero BLF1800
ANFF OPTOFAB Adelaide
Custom Glass Melter
ANFF OPTOFAB Adelaide
Furnace, Hitech CTF/150/3Z/1200C
ANFF QLD UQ - AIBN
Furnace, Hitech Oxidation
ANFF QLD Griffith
Furnace, Labec / MKS HTF40/12 / Various
ANFF SA Flinders
Furnace, Thermal (Wet/Dry)
ANFF VIC MCN
Muffle Furnace
ANFF NSW UNSW
Open Air Furnace, Tetlow 1550C
ANFF OPTOFAB Adelaide
Oxidation furnace, Thermco
ANFF NSW UNSW
Oxidation furnace, Thermco UDOX
ANFF NSW UNSW
Sintering furnace, Carbolite Gero AAF12/18
ANFF VIC RMIT
Tube Furnace, Carbolite Gero
ANFF MATERIALS Wollongong
Tube Furnace, Carbolite Gero TF3 - 1600
ANFF OPTOFAB Adelaide
Tube Furnace, Firing furnace
ANFF VIC RMIT
Tube Furnace, Labec 1700C (1000mm tube)
ANFF NSW UTS
Tube Furnace, Labec 1700C (750mm tube)
ANFF NSW UTS
Tube furnace, Lindberg BlueM STF55 6" (1100C)
ANFF OPTOFAB ANU
Tube Furnace, STF 1200C
ANFF NSW UTS
TOOL MAKE AND MODEL
LOCATION
Tube furnace, Lindberg BlueM STF55 6″ (1100C)
High temperature annealing
Description
Up to 1100C 3 zone tube furnace for processing 100mm wafers. Ar and O2 available.
Related Information
High temperature annealing
Tool Contact
stephen.madden@anu.edu.au
TOOL MAKE AND MODEL
LOCATION
Annealing furnace, GaAs ULVAC MILA-500
Description
Compact annealing furnace designed for precise thermal processing of gallium arsenide (GaAs) and other semiconductor materials. It features rapid heating and cooling capabilities, a clean heating environment, and precise temperature control.
Related Information
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
LOCATION
Annealing furnace, GP ULVAC MILA-500
Description
Compact annealing furnace designed for precise thermal processing of various materials. It features rapid heating and cooling capabilities, a clean heating environment, and precise temperature control. This system is ideal for applications such as diffusion annealing, oxide film deposition, and post-ion implantation annealing.
Related Information
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
LOCATION
Custom Glass Melter
Controlled atmosphere oxide glass melting facilities.
Description
Facility consisting of a 6-port Heraeus glovebox with integrated furnaces
Related Information
Consists of one 900 degree C melting furnace, and three 500 C degree annealing furnaces. Controlled atmosphere oxide glass melting facilities.
Tool Contact
optofab@adelaide.edu.au
TOOL MAKE AND MODEL
LOCATION
Furnace, Hitech CTF/150/3Z/1200C
Oxidation Furnace
Description
Dry thermal oxidation produces high integrity oxides compared to sputtered, evaporated or PECVD films. Dry thermal oxidation of silicon to create SiO2 films up to 300 nm thick. The temperature and gas flow are tightly controlled.
Related Information
Silicon is heated to more than 1,000°C in an oxygen rich environment. Highly customisable gas flow and temperature profiles.Sample size of up to 6"" wafers. Up to 25 wafers per run. Maximum temperature of 1200°C. Oxidation Furnace
Tool Contact
anff@uq.edu.au
TOOL MAKE AND MODEL
LOCATION
Furnace, Hitech Oxidation
Description
Small batch size horizontal atmospheric furnace for the thermal oxidation of Silicon
Related Information
Oxidation furnace for the thermal oxidation of Silicon.
Tool Contact
glenn.walker@griffith.edu.au
TOOL MAKE AND MODEL
LOCATION
Furnace, Labec / MKS HTF40/12 / Various
Tube furnace and chemical vapour deposition system (CVD)
Description
High temperature furnace with a programmable gas flow system.
Related Information
Up to 1,200°C quartz tube furnace attached to a programmable 4 channel gas flow manifold suitable for chemical vapour deposition. Tube furnace and chemical vapour deposition system (CVD)
Tool Contact
Jason.Gascooke@flinders.edu.au
TOOL MAKE AND MODEL
LOCATION
Furnace, Thermal (Wet/Dry)
Description
Wet and dry oxidation furnace.
Related Information
Supports up to 150mm in diameter and can deposit up to 50 wafers in one run.
Tool Contact
mcn-enquiries@nanomelbourne.com
TOOL MAKE AND MODEL
LOCATION
Muffle Furnace
Description
Laboratory instrument designed for high-temperature applications, such as ashing, heat treatment, and material testing. It isolates the sample from combustion byproducts, ensuring a clean environment for precise analysis.
Related Information
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
LOCATION
Oxidation furnace, Thermco
Oxidation furnace for Si only
Description
The Thermco Clean Si Oxidation Furnace is a high-precision thermal processing system designed for semiconductor oxidation and diffusion processes. It provides uniform heating and precise gas flow control, ensuring consistent oxide layer formation on wafers.
Related Information
More information to come. Oxidation furnace for Si only
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
LOCATION
Oxidation furnace, Thermco UDOX
Ultra dry oxidation (UDOX) furnace for Si only
Description
UDOX ultra-clean Si oxidation furnace (MOS)
Related Information
More information to come. Ultra dry oxidation (UDOX) furnace for Si only
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
LOCATION
Tube Furnace, Carbolite Gero
Horizontal furnace
Description
The Carbolite Gero Tube Furnace is a high-precision thermal processing system designed for uniform heating of small samples in laboratories and industrial applications. It offers excellent temperature control and customisable configurations for various heat treatment processes.
Related Information
More information to come. Horizontal furnace
Tool Contact
anff-materials@uow.edu.au
TOOL MAKE AND MODEL
LOCATION
Tube Furnace, Firing furnace
Tube furnace
Description
1200C Tube furnaces (3-zone)
Related Information
1200C Tube furnace (3-zone) Tube furnace
Tool Contact
arnan.mitchell@rmit.edu.au