Maskless lithography
Maskless lithography
Maskless lithography can be used to speed up the lithography process, and to save money by negating the need to fabricate steps required. Micropatterning is a lithography process that involves an image being projected directly onto a photoresist without the use of a mask.
List of available equipment
TOOL MAKE AND MODEL
LOCATION
Direct writer, DMO ML3 Pro
ANFF NSW UNSW
Maskless UV exposure system, Intelligent Micropatterning SF100 XPRESS
ANFF VIC MCN
Maskless Writer with backside alignment, ML3 Pro DMO
ANFF NSW UNSW
TOOL MAKE AND MODEL
LOCATION
Direct writer, DMO ML3 Pro
Description
Direct write maskless aligner
Related Information
Tool Contact
anff@unsw.edu.au
TOOL MAKE AND MODEL
LOCATION
Maskless UV exposure system, Intelligent Micropatterning SF100 XPRESS
Maskless micropatterning system
Description
A maskless photolithography system capable of writing features down to 1 μm, that offers speed and cost benefits over masked systems.
Related Information
A wide range of materials can be processed, and provides great control in writing and aligning fine features on smaller substrates. The process us non-contact, which reduces risk of damaged samples. Commonly used to quickly and accurately create photomasks. Maskless micropatterning system
Tool Contact
mcn-enquiries@nanomelbourne.com